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碳化矽電熱元件在不同(tóng)氣氛下的使用溫度和表麵負荷


氣氛

 

Atmosphere

爐溫(℃)

 

Furnace

表麵負荷

(W/cm2

Surface Load

對元件的影響

 

Effect On Elements

解決辦法


Solution

1290

3.8

與sic作用生成甲烷減少sio2保護膜(mó) Decreasing SiO2 protective film by Acting with SiC to generate Methane

露點激活

Make it active at dew point

CO₂

1450

3.1

腐蝕(shí)碳化矽(guī)  Attacking sic

用石英管保(bǎo)護

Protecting by quartz tube

18%CO

1500

4.0

無影響  No

 

20%CO

130

3.8

吸附碳粒影響sio2保護膜   Affecting SiO2 protective film by Adsorbing C grains

 

鹵素(sù)

704

3.8

腐蝕碳化矽減少sio2保護膜 Decreasing SiO2 protective film by eroding SiC

用石英(yīng)管保護

Protecting by quartz tube

碳氫化合物

1310

3.1

吸附碳粒致熱汙染,分解的碳(tàn)沉積,易造成電氣(qì)故障  Causing hot pollution by adsorbing C grains

送進(jìn)充分的空氣

Filling with plenty of air

1290

3.1

與sic作用反應生成(chéng)甲烷,減少sic2保護膜 Decreasing SiO2 protective film by Acting with SiC to generate Methane

露(lù)點激活

Make it Active at dew point

甲烷

1370

3.1

吸附碳粒致熱汙染  Causing hot pollution by adsorbing C grains

 

N

1370

3.1

與sic反應(yīng)形成氮化矽(guī)絕緣 Generating SiN insulating layer by acting with SiC

 

Na

1310

3.8

侵蝕碳化矽(guī)  Eroding sic

用石英管保(bǎo)護

Protecting by quartz tube

SO2

1310

3.8

侵蝕碳化矽  Eroding sic

用石英管保護

Protecting by quartz tube

真(zhēn)空

1204

3.8

 

 

1310

3.8

碳化矽被氧化 Sic oxidized

 

水(shuǐ)(不同含量(liàng))

1090-1370

3.1-3.6

與sic作用生成矽的水化物(wù)

Generating hydrate of silicon by acting on SiC

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